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X-ORIGINAL-URL:https://strobe.colorado.edu/
X-WR-CALNAME:STROBE
X-WR-CALDESC:Building the Microscopes of Tomorrow
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BEGIN:VEVENT
CLASS:PUBLIC
DTSTART;TZID=America/Denver:20200925T110000
DTEND;TZID=America/Denver:20200925T120000
DTSTAMP:20200924T182100
UID:MEC-7274a60c83145b1082be9caa91926ecf@strobe.colorado.edu
CREATED:20200924
LAST-MODIFIED:20201023
PRIORITY:5
TRANSP:OPAQUE
SUMMARY:STROBE Student Postdoc Council Industry Seminar: “An Introduction to EUV Light Sources” from ASML
DESCRIPTION:Join us on Zoom on Friday for a STROBE Student-Postdoc Council Seminar from ASML!\nPresenter: Dr. Michael Purvis, EUV Source Technology Development Team Manager at ASML – San Diego\nAbstract: ASML’s EUV scanners are installed at customer factories and have begun high volume manufacturing (HVM) of high-end semiconductor devices. The latest generation of EUV sources, developed at Cymer in San Diego, operates at 250W of EUV power, while maintaining stringent control of energy stability and dose control, with improved availability and a design for serviceability concept. In this talk, we provide an overview of tin laser-produced-plasma (LPP) extreme-ultraviolet (EUV) sources at 13.5nm enabling HVM at the N5 node and beyond. The field performance of  sources at 250 watts power including the performance of subsystems such as the Collector and the Droplet Generator will be shown. Progress in the development of key technologies for power scaling towards 500W will be described.\nAbout the Speaker: Michael Purvis serves as a manager within the EUV Source Technology Development Team at ASML San Diego. Dr. Purvis received his B.A, M.S. and Ph.D. degrees in Electrical and Computer Engineering from Colorado State University. His thesis work was performed at the National Science Foundation Engineering Research Center for Extreme Ultraviolet Light. Michael has published numerous times in the field of laser created plasmas. His initial investigations at Colorado State University included developing discharge and laser produced EUV lasers for applications in plasma diagnostics; subsequent to this he worked on theoretical plasma modeling and high energy density plasma experiments at CSU, Lawrence Livermore National Labs and SLAC. Michael is currently applying his experience with laser produced plasma towards the development of EUV light sources at ASML. His work at ASML is focused on scaling EUV power output to meet semiconductor industry requirements for high volume manufacturing.\n
URL:https://strobe.colorado.edu/news-events/events/strobe-student-postdoc-council-industry-seminar-an-introduction-to-euv-light-sources-from-asml/
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