Brookhaven National Laboratory

Upton, NY

January 10, 2025

Open Until Filled

The NSLS-II is seeking an exceptional Postdoctoral Research Associate to join a co-design research effort that aims at advancing extreme ultraviolet lithography (EUVL) nanofabrication well beyond the conventional lithography approaches, taking advantage of the world-leading expertise in X-ray metrology at NSLS-II, nanofabrication at the Center for Functional Nanomaterials (CFN), and machine learning (ML) at the Computational Science Initiative (CSI).

The selected candidate will collaborate with scientists at CFN and CSI to optimize the EUVL performance through rigorous simulations as well as machine-learning networks that account for the light-matter interactions in various wavelength regimes, and real light source parameters such as coherence, polarization, monochromaticity, and flux uniformity. The candidate is also expected to conduct x-ray characterizations at beamlines, using state-of-the-art microscopy techniques like coherent scattering and ptychographic imaging. The candidate will actively collaborate with researchers at external facilities such as the Advanced Light Source of Lawrence Berkeley National Laboratory and the X-ray Interference Lithography beamline at Paul Scherrer Institute of Swiss Light Source. As part of the Imaging & Microscopy team at NSLS-II, the candidate will have opportunities to collaborate using the state-of-the-art capabilities of the imaging and microscopy beamlines at NSLS-II.

For more information: https://jobs.bnl.gov/job/upton/postdoctoral-research-associate-an-advanced-x-ray-characterization-technique-for-angstrom-era-semic/3437/71064858816

Thomas Feggeler

tfeggeler1@bnl.gov

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