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ASML’s EUV scanners are installed at customer factories and have begun high volume manufacturing (HVM) of high-end semiconductor devices. The latest generation of EUV sources, developed at Cymer in San Diego, operates at 250W of EUV power, while maintaining stringent control of energy stability and dose control, with improved availability and a design for serviceability concept. In this talk, we provide an overview of tin laser-produced-plasma (LPP) extreme-ultraviolet (EUV) sources at 13.5nm enabling HVM at the N5 node and beyond. The field performance of  sources at 250 watts power including the performance of subsystems such as the Collector and the Droplet Generator will be shown. Progress in the development of key technologies for power scaling towards 500W will be described.