Coherent EUV Light Sources Based on High-Order Harmonic Generation: Principles and Applications in Nanotechnology

Refereed Designation:Refereed
Publication Type
Book Chapter
Publication Year
2023
Authors
Kapteyn, Henry,
Murnane, Margaret M.,
Esashi, Yuka,
Tanksalvala, Michael,
Knobloch, Joshua L.,
Liao, Chen-Ting,
Hickstein, Daniel D.,
Bargsten, Clayton,
Dorney, Kevin,
Petersen, John
Photon Sources for Lithography and Metrology
URL
https://spie.org/Publications/Book/2638241?SSO=1

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