STROBE Publications

Complex EUV imaging reflectometry: spatially resolved 3D composition determination and dopant profiling with a tabletop 13nm source

Refereed Designation:Non-refereed/STROBE-contributed
Publication Type
Conference Paper
Publication Year
2018
Authors
Karl, Robert,
Johnsen, Peter,
Adams, Daniel E.,
Kapteyn, Henry C.,
Murnane, Margaret M.,
Horiguchi, Naoto,
Porter, Christina L.,
Tanksalvala, Michael,
Gerrity, Michael,
Miley, Galen P.,
Zhang, Xiaoshi,
Bevis, Charles S.,
Esashi, Yuka
Conference Name
Metrology, Inspection, and Process Control for Microlithography XXXII
Conference Location
San Jose, California, United States
Publication Date
2018-03-13
Publisher
SPIE
URL
http://dx.doi.org/10.1117/12.2297464
DOI
10.1117/12.2297464