High-fidelity complex EUV imaging reflectometry for depth-dependent composition determination

Non-refereed/STROBE-contributed

Publication Type: Conference Paper
Publication Year: 2020
Authors: Esashi, Yuka,

Tanksalvala, Michael,

Porter, Christina,

Jenkins, Nicholas,

Zhang, Zhe,

Wang, Bin,

Miley, Galen P.,

Knobloch, Joshua,

Horiguchi, Naoto,

Zhou, Jihan,

Hostler, Eric,

Bevis, Charles,

Karl, Robert M.,

Johnsen, Peter,

Jacobs, Matthew,

Cousin, Seth,

Liao, Chen-Ting,

Miao, Jianwei,

Gerrity, Michael,

Kapteyn, Henry C.,

Murnane, Margaret M.
Conference Name: SPIE Advanced Lithography: Metrology, Inspection, and Process Control for Microlithography XXXIV
Conference Location: San Jose, California, United States
Publication Date: 2020-02
URL: https://spie.org/AL20/conferencedetails/metrology-inspection-process-control-microlithography

STROBE Publications