STROBE Publications

High-fidelity complex EUV imaging reflectometry for depth-dependent composition determination

Refereed Designation:Non-refereed/STROBE-contributed
Publication Type
Conference Paper
Publication Year
2020
Authors
Esashi, Yuka,
Tanksalvala, Michael,
Porter, Christina,
Jenkins, Nicholas,
Zhang, Zhe,
Wang, Bin,
Miley, Galen P.,
Knobloch, Joshua,
Horiguchi, Naoto,
Zhou, Jihan,
Hostler, Eric,
Bevis, Charles,
Karl, Robert M.,
Johnsen, Peter,
Jacobs, Matthew,
Cousin, Seth,
Liao, Chen-Ting,
Miao, Jianwei,
Gerrity, Michael,
Kapteyn, Henry C.,
Murnane, Margaret M.
Conference Name
SPIE Advanced Lithography: Metrology, Inspection, and Process Control for Microlithography XXXIV
Conference Location
San Jose, California, United States
Publication Date
2020-02
URL
https://spie.org/AL20/conferencedetails/metrology-inspection-process-control-microlithography