Robust and reliable actinic ptychographic imaging of highly periodic structures in EUV photomasks

Refereed Designation:Non-refereed/STROBE-contributed
Publication Type
Journal Article
Publication Year
2022
Authors
Wang, Bin,
Brooks, Nathan,
Tanksalvala, Michael,
Esashi, Yuka,
Jenkins, Nicolas,
Johnsen, Peter,
Binnie, Iona,
Gui, Guan,
Shao, Yunzhe,
Murnane, Margaret,
Kapteyn, Henry
Journal
Photomask Technology 2022
Volume
12293
Pages
122930D
Publication Date
2022-12-1
Publisher
SPIE
URL
http://dx.doi.org/10.1117/12.2641726
DOI
10.1117/12.2641726

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