STROBE Publications

Variable-wavelength tabletop-scale EUV ptychographic complex imaging reflectometry for 3D composition determination

Refereed Designation:Non-refereed/STROBE-contributed
Publication Type
Conference Paper
Publication Year
2019
Authors
Tanksalvala, Michael,
Porter, Christina L.,
Esashi, Yuka,
Miley, Galen P.,
Karl, Robert,
Johnsen, Peter,
Jenkins, Nicholas W.,
Bevis, Charles S.,
Wang, Bin,
Thurston, Jeremy,
Zhang, Xiaoshi,
Cousin, Seth L.,
Adams, Daniel E.,
Gerrity, Michael,
Kapteyn, Henry C.,
Murnane, Margaret M.
Conference Name
Metrology, Inspection, and Process Control for Microlithography XXXIII
Conference Location
San Jose, California, United States
Publication Date
2019-03-26
Publisher
SPIE
URL
http://dx.doi.org/10.1117/12.2516827
DOI
10.1117/12.2516827