Variable-wavelength tabletop-scale EUV ptychographic complex imaging reflectometry for 3D composition determination
Refereed Designation:Non-refereed/STROBE-contributed
- Publication Type
- Conference Paper
- Publication Year
- 2019
- Authors
-
Tanksalvala, Michael,
Porter, Christina L.,
Esashi, Yuka,
Miley, Galen P.,
Karl, Robert,
Johnsen, Peter,
Jenkins, Nicholas W.,
Bevis, Charles S.,
Wang, Bin,
Thurston, Jeremy,
Zhang, Xiaoshi,
Cousin, Seth L.,
Adams, Daniel E.,
Gerrity, Michael,
Kapteyn, Henry C.,
Murnane,
Margaret M.
- Conference Name
- Metrology, Inspection, and Process Control for Microlithography XXXIII
- Conference Location
- San Jose, California, United States
- Publication Date
- 2019-03-26
- Publisher
- SPIE
- URL
- http://dx.doi.org/10.1117/12.2516827
- DOI
- 10.1117/12.2516827
