Enhanced EUV mask imaging using Fourier ptychographic microscopy

Refereed Designation:Non-refereed/STROBE-contributed
Publication Type
Journal Article
Publication Year
2025
Authors
Gu, Chaoying,
Islegen-Wojdyla, Antoine,
Benk, Markus P.,
Goldberg, Kenneth A.,
Waller, Laura
Journal
Optical and EUV Nanolithography XXXVIII
Volume
13424
Pages
40
Publication Date
2025-4-22
Publisher
SPIE
URL
http://dx.doi.org/10.1117/12.3051223
DOI
10.1117/12.3051223

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