Optimizing experimental design for fast and accurate CD metrology of interconnects using coherent extreme-ultraviolet scatterometryRefereed Designation:Refereed Publication Type Journal Article Publication Year 2026 Authors Klein, Clay, Jenkins, Nicholas W., Shao, Yunzhe, Li, Yunhao, Shin, Junho, Park, Seungbeom, Kim, Wookrae, Kapteyn, Henry C., Murnane, Margaret M. Journal Journal of Micro/Nanopatterning, Materials, and Metrology Short Title J. Micro/Nanopattern. Mats. Metro. Volume 25 Issue 1 Pages 014001-1 Publication Date 2026-2-13 Publisher SPIE-Intl Soc Optical Eng URL http://dx.doi.org/10.1117/1.JMM.25.1.014001 DOI 10.1117/1.jmm.25.1.014001 PDF of Paper Previous Next
